User contributions for Cmditradmin
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- 15:23, 4 January 2010 diff hist +62 m Acronyms →Acronymns
- 15:21, 4 January 2010 diff hist +504 Nm Electric-field induced second-harmonic generation New page: === Overview === Electric-field induced second-harmonic generation (EFISH) is a technique to measure the molecular first hyperpolarizability of EO molecules. A strong electr field is use... current
- 15:13, 4 January 2010 diff hist +106 m First hyperpolarizability current
- 15:11, 4 January 2010 diff hist +8 m Variables and Constants →EO Properties
- 15:10, 4 January 2010 diff hist +7 m Electro-optic cofficient →Measurement
- 15:09, 4 January 2010 diff hist −40 m Main Page →Research Equipment, Devices and Techniques
- 15:09, 4 January 2010 diff hist +30 N Teng-Mann Method for Measuring Electro-optic coefficient Teng-Mann Method for Measuring Electro-optic coefficient moved to Teng-Mann Method current
- 15:09, 4 January 2010 diff hist 0 m Teng-Man Method Teng-Mann Method for Measuring Electro-optic coefficient moved to Teng-Mann Method
- 15:08, 4 January 2010 diff hist −40 m Second-order Material Characterization →Teng-Mann Method for Measuring Electro-optic coefficient
- 15:07, 4 January 2010 diff hist +70 m Electro-optic cofficient
- 15:06, 4 January 2010 diff hist −2 m Variables and Constants →EO Properties
- 15:05, 4 January 2010 diff hist −1 m Acronyms →Acronymns
- 15:05, 4 January 2010 diff hist 0 m Electro-optic cofficient Electro-optic cofficient moved to Electrooptic cofficient
- 15:04, 4 January 2010 diff hist −8 m Second-order NLO Materials
- 14:57, 4 January 2010 diff hist +1 m Main Page →Research Equipment, Devices and Techniques
- 14:56, 4 January 2010 diff hist +42 N Attenuated Total Reflection Attenuated Total Reflection moved to Attenuated Total Reflectance current
- 14:56, 4 January 2010 diff hist 0 m Attenuated Total Reflectance Attenuated Total Reflection moved to Attenuated Total Reflectance
- 14:56, 4 January 2010 diff hist +204 Nm Attenuated Total Reflectance New page: === Overview === Attenuated Total Reflection or ATR is a technique used together with Teng Mann to measure the R33 of electrooptic materials. === Technique === === Significance === ==...
- 14:53, 4 January 2010 diff hist +33 m Main Page →Research Equipment, Devices and Techniques
- 13:08, 4 January 2010 diff hist +192 m Ellipsometer
- 13:08, 4 January 2010 diff hist +192 m Profilometer
- 13:07, 4 January 2010 diff hist +193 m UV/VIS/NIR spectrometer
- 13:06, 4 January 2010 diff hist +30 m Ellipsometer →Techique
- 13:02, 4 January 2010 diff hist +101 m UV/VIS/NIR spectrometer →Overview
- 11:33, 4 January 2010 diff hist +7 m Organic Photovoltaic Fabrication and Test Apparatus →Significance
- 11:33, 4 January 2010 diff hist 0 m Organic Photovoltaic Fabrication and Test Apparatus →Significance
- 11:32, 4 January 2010 diff hist −15 m Organic Photovoltaic Fabrication and Test Apparatus →Significance
- 11:25, 4 January 2010 diff hist +680 m Organic Photovoltaic Fabrication and Test Apparatus →Significance
- 11:24, 4 January 2010 diff hist +136 N File:ITO-OPV.png Diogenes Placentia, Alex Veneman and Neal Armstrong, Poster Characterizing and Modifying the ITO/Organic Interface: Organic Solar Cells current
- 10:55, 4 January 2010 diff hist +125 m Hyper Rayleigh Scattering →Technique
- 09:52, 4 January 2010 diff hist +783 m Conducting Tip Atomic Force Microscopy →Significance
- 09:51, 4 January 2010 diff hist +20 N File:ITO-IVCURVE.png Alex Veneman- U of A current
- 09:34, 4 January 2010 diff hist +523 m Conducting Tip Atomic Force Microscopy →Operation
- 09:33, 4 January 2010 diff hist +7 m Conducting Tip Atomic Force Microscopy →Significance
- 09:32, 4 January 2010 diff hist 0 m Conducting Tip Atomic Force Microscopy →Significance
- 09:32, 4 January 2010 diff hist +2,305 m Conducting Tip Atomic Force Microscopy →Signficance
- 09:32, 4 January 2010 diff hist 0 File:Itopics.png uploaded a new version of "Image:Itopics.png" current
- 09:29, 4 January 2010 diff hist +39 N File:Itopics.png Alex Veneman - U of A - EffectPEDOT.ppt
- 13:28, 29 December 2009 diff hist +85 m E-beam Lithography →Operation
- 13:25, 29 December 2009 diff hist +1 m E-beam Lithography →Operation
- 13:25, 29 December 2009 diff hist +77 m E-beam Lithography →SEM with Nabity
- 13:22, 29 December 2009 diff hist +34 m Spin coater
- 13:21, 29 December 2009 diff hist +67 m Spin coater
- 13:12, 29 December 2009 diff hist +217 Nm UV/VIS/NIR spectrometer New page: === Overview === The spectrometer measures the optical absorption of light in several different spectral ranges. === Operation === {{#ev:youtube|O39avevqndU}} === Significance === [[...
- 13:08, 29 December 2009 diff hist +4 m Main Page →Research Equipment, Devices and Techniques
- 12:40, 29 December 2009 diff hist +28 m Profilometer →Technique
- 12:30, 29 December 2009 diff hist +85 m The Need for Photonic Integration current
- 12:29, 29 December 2009 diff hist +50 m Current OPV Research Directions
- 12:28, 29 December 2009 diff hist +49 m Materials Processing and Fabrication
- 12:26, 29 December 2009 diff hist +30 m Electro-optic Polymers and Devices current
