Difference between revisions of "Spin coater"
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=== Overview === | |||
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials. | Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials. | ||
see Wikipedia on [http://en.wikipedia.org/wiki/Spin_coater Spin Coating] | see Wikipedia on [http://en.wikipedia.org/wiki/Spin_coater Spin Coating] | ||
=== Operation=== | |||
{{#ev:youtube|IJqo9M0YvqM}} | |||
Training video on [http://grover.mirc.gatech.edu/training/viewVideo.php?video=rc8-high&size=2 RC8 Spin Coater from GT MiRC] | Training video on [http://grover.mirc.gatech.edu/training/viewVideo.php?video=rc8-high&size=2 RC8 Spin Coater from GT MiRC] | ||
Training video on [http://grover.mirc.gatech.edu/training/viewVideo.php?video=ceespinner-high&size=0 CEE Spin Coater from GT MiRC] | Training video on [http://grover.mirc.gatech.edu/training/viewVideo.php?video=ceespinner-high&size=0 CEE Spin Coater from GT MiRC] | ||
Revision as of 14:21, 29 December 2009
Overview
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials.
see Wikipedia on Spin Coating
Operation
Training video on RC8 Spin Coater from GT MiRC
Training video on CEE Spin Coater from GT MiRC