Difference between revisions of "Laser Mask Generator"
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Revision as of 09:18, 8 August 2011
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Overview
The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to 3nm. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps.