Difference between revisions of "Spin coater"
Jump to navigation
Jump to search
Cmditradmin (talk | contribs) m |
Cmditradmin (talk | contribs) m (→Operation) |
||
Line 10: | Line 10: | ||
{{#ev:youtube|IJqo9M0YvqM}} | {{#ev:youtube|IJqo9M0YvqM}} | ||
=== Links === | |||
*[[wikipedia: Spin Coating]] | |||
Training video on [http://grover.mirc.gatech.edu/training/viewVideo.php?video=ceespinner-high&size=0 CEE Spin Coater from GT MiRC] | *[http://grover.mirc.gatech.edu/training/viewVideo.php?video=rc8-high&size=2 Training video on RC8 Spin Coater from GT MiRC] | ||
*[http://grover.mirc.gatech.edu/training/viewVideo.php?video=ceespinner-high&size=0 Training video on CEE Spin Coater from GT MiRC] | |||
[[category:Research equipment]] | [[category:Research equipment]] |
Revision as of 12:28, 22 November 2010
Overview
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials.
see Wikipedia on Spin Coating