Difference between revisions of "Physical Vapor Deposition PVD - Vacuum/thermal coater"
Jump to navigation
Jump to search
Cmditradmin (talk | contribs) |
Cmditradmin (talk | contribs) m |
||
Line 1: | Line 1: | ||
<table id="toc" style="width: 100%"> | |||
<tr> | |||
<td style="text-align: center; width: 33%">[[Main_Page#Research Equipment, Devices and Techniques|Return to Research Tool Menu]]</td> | |||
</table> | |||
=== Background === | |||
Thermal vacuum coater is one the simplest and oldest of the physical vapor deposition techniques. A solid sample of material is heated in a vacuum and the particles that are released travel though the chamber and condense on the substrate. | |||
=== Significance === | |||
=== Operation === | |||
=== External Links === | |||
see [[wikipedia:Physical_vapor_deposition]] | see [[wikipedia:Physical_vapor_deposition]] | ||
see [[wikipedia:Evaporation_(deposition)]] |
Revision as of 12:19, 16 September 2010
Return to Research Tool Menu |
Background
Thermal vacuum coater is one the simplest and oldest of the physical vapor deposition techniques. A solid sample of material is heated in a vacuum and the particles that are released travel though the chamber and condense on the substrate.
Significance
Operation
External Links
see wikipedia:Physical_vapor_deposition see wikipedia:Evaporation_(deposition)