Difference between revisions of "Laser Mask Generator"
Jump to navigation
Jump to search
Cmditradmin (talk | contribs) m |
Cmditradmin (talk | contribs) m |
||
| Line 1: | Line 1: | ||
<table id="toc" style="width: 100%"> | <table id="toc" style="width: 100%"> | ||
<tr> | <tr> | ||
<td style="text-align: center; width: 33%">[[Main_Page# | <td style="text-align: center; width: 33%">[[Main_Page#Synthesis_and_Fabrication|Return to Research Tool Menu]]</td> | ||
</tr> | </tr> | ||
Latest revision as of 09:43, 11 October 2011
| Return to Research Tool Menu |
Overview
The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to 3μm. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps. The mask generator is useful for rapid fabrication of prototype electronic devices, micromechanical devices and hybrid devices.
Significance
This animation shows the steps in using a positive photoresist. The exposed portions wash away after development. In a negative photoresist such as SU-8 the exposed portions remain while the unexposed areas are washed away. <swf width="400" height="331">images/3/3d/Maskwriter.swf</swf>