Difference between revisions of "Spin coater"
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=== Overview === | |||
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials. | Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials. | ||
=== Operation=== | |||
{{#ev:youtube|IJqo9M0YvqM}} | |||
=== Links === | |||
*[[wikipedia:Spin coating]] | |||
*[http://grover.mirc.gatech.edu/training/viewVideo.php?video=rc8-high&size=2 Training video on RC8 Spin Coater from GT MiRC] | |||
*[http://grover.mirc.gatech.edu/training/viewVideo.php?video=ceespinner-high&size=0 Training video on CEE Spin Coater from GT MiRC] | |||
[[category:Research equipment]] | |||
Latest revision as of 10:09, 11 October 2011
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Overview
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials.