Difference between revisions of "Spin coater"
Jump to navigation
Jump to search
Cmditradmin (talk | contribs) m (→Links) |
Cmditradmin (talk | contribs) m (→Overview) |
||
| Line 2: | Line 2: | ||
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials. | Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials. | ||
=== Operation=== | === Operation=== | ||
Revision as of 10:46, 11 October 2011
Overview
Spin coating is method to apply uniform thin coatings to substrates. It is widely used in microfabrication for applying photoresist. In photonics research it is used to directly fabricate devices with thin layers of organic materials.