E-beam Lithography
Revision as of 12:04, 10 September 2009 by Cmditradmin (talk | contribs) (New page: E-beam lithography is the process of directing an electron beam across a resist layer and thereby creating a pattern that can be etched. Structures of 20nm can be produced. This is the tec...)
E-beam lithography is the process of directing an electron beam across a resist layer and thereby creating a pattern that can be etched. Structures of 20nm can be produced. This is the technique that is often used to create nano scale waveguides and microring resonators.
See Wikipedia E-beam lithography