Laser Mask Generator - Revision history

Cmditradmin at 17:43, 11 October 2011

2011-10-11T17:43:38Z

← Older revision		Revision as of 10:43, 11 October 2011
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	<table id="toc" style="width: 100%">		<table id="toc" style="width: 100%">
	<tr>		<tr>
	<td style="text-align: center; width: 33%">[[Main_Page#~~Research Equipment, Devices and Techniques~~\|Return to Research Tool Menu]]</td>		<td style="text-align: center; width: 33%">[[Main_Page#Synthesis_and_Fabrication\|Return to Research Tool Menu]]</td>

	</tr>		</tr>

2011-09-29T21:52:26Z

← Older revision		Revision as of 14:52, 29 September 2011
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	<swf width="400" height="331">images/3/3d/Maskwriter.swf</swf>		<swf width="400" height="331">images/3/3d/Maskwriter.swf</swf>

	=== ~~Procedure~~ ===		=== Operation ===
	{{#ev:youtube\|emug1a4OlS8}}		{{#ev:youtube\|emug1a4OlS8}}

2011-09-29T21:42:59Z

Significance

← Older revision		Revision as of 14:42, 29 September 2011
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	=== Significance ===		=== Significance ===
	This animation shows the steps in using a positive photoresist. The exposed portions wash away after development. In a negative photoresist such as SU-8 the exposed portions remain while the unexposed areas are washed away.		This animation shows the steps in using a positive photoresist. The exposed portions wash away after development. In a negative photoresist such as SU-8 the exposed portions remain while the unexposed areas are washed away.
	<swf width="~~500~~" height="331">images/3/3d/Maskwriter.swf</swf>		<swf width="400" height="331">images/3/3d/Maskwriter.swf</swf>

	=== Procedure ===		=== Procedure ===

2011-08-23T15:41:12Z

Procedure

2011-08-08T21:03:24Z

Significance

← Older revision		Revision as of 14:03, 8 August 2011
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	=== Significance ===		=== Significance ===
			This animation shows the steps in using a positive photoresist. The exposed portions wash away after development. In a negative photoresist such as SU-8 the exposed portions remain while the unexposed areas are washed away.
	<swf width="500" height="331">images/3/3d/Maskwriter.swf</swf>		<swf width="500" height="331">images/3/3d/Maskwriter.swf</swf>

2011-08-08T17:46:34Z

Significance

← Older revision		Revision as of 10:46, 8 August 2011
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	=== Significance ===		=== Significance ===
	<swf width="~~720~~" height="~~480~~">images/3/3d/Maskwriter.swf</swf>		<swf width="500" height="331">images/3/3d/Maskwriter.swf</swf>

	=== Procedure ===		=== Procedure ===

2011-08-08T17:41:26Z

Significance

← Older revision		Revision as of 10:41, 8 August 2011
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	=== Significance ===		=== Significance ===
	<swf width="~~500~~" height="~~400~~">images/3/3d/Maskwriter.swf</swf>		<swf width="720" height="480">images/3/3d/Maskwriter.swf</swf>

	=== Procedure ===		=== Procedure ===

2011-08-08T16:26:08Z

Significance

← Older revision		Revision as of 09:26, 8 August 2011
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	=== Significance ===		=== Significance ===
			<swf width="500" height="400">images/3/3d/Maskwriter.swf</swf>


	=== Procedure ===		=== Procedure ===

2011-08-08T16:22:41Z

Overview

← Older revision		Revision as of 09:22, 8 August 2011
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	=== Overview ===		=== Overview ===
	The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to ~~3nm~~. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps.		The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to 3μm. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps. The mask generator is useful for rapid fabrication of prototype electronic devices, micromechanical devices and hybrid devices.

	=== Significance ===		=== Significance ===