E-beam Lithography - Revision history

Cmditradmin: moved E-beam lithographys to E-beam Lithography

2011-10-18T15:42:57Z

moved E-beam lithographys to E-beam Lithography

← Older revision	Revision as of 08:42, 18 October 2011
(No difference)

Cmditradmin: moved E-beam lithography to E-beam lithographys: E-beam Lithography

2011-10-18T15:40:02Z

moved E-beam lithography to E-beam lithographys: E-beam Lithography

← Older revision	Revision as of 08:40, 18 October 2011
(No difference)

Cmditradmin at 17:40, 11 October 2011

2011-10-11T17:40:14Z

← Older revision		Revision as of 10:40, 11 October 2011
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	<table id="toc" style="width: 100%">		<table id="toc" style="width: 100%">
	<tr>		<tr>
	<td style="text-align: center; width: 33%">[[Main_Page#~~Research Equipment, Devices and Techniques~~\|Return to Research Tool Menu]]</td>		<td style="text-align: center; width: 33%">[[Main_Page#Synthesis_and_Fabrication\|Return to Research Tool Menu]]</td>

	</tr>		</tr>

Cmditradmin at 22:04, 2 June 2011

2011-06-02T22:04:50Z

← Older revision		Revision as of 15:04, 2 June 2011
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	</table>		</table>
	=== Overview ===		=== Overview ===

	E-beam lithography is the process of directing an electron beam across a resist layer and thereby creating a pattern that can be etched. Structures of 20nm can be produced. This is the technique that is often used to create nano scale waveguides and microring resonators. One type uses an scanning electron microscope equipped with special beam control software. The other far more expensive method is a dedicated e-beam facility that is able to etch structures directly.		E-beam lithography is the process of directing an electron beam across a resist layer and thereby creating a pattern that can be etched. Structures of 20nm can be produced. This is the technique that is often used to create nano scale waveguides and microring resonators. One type uses an scanning electron microscope equipped with special beam control software. The other far more expensive method is a dedicated e-beam facility that is able to etch structures directly.

	[[Image:Si waveguide em.jpg\|thumb\|300px\|Silicon waveguide in which EO polymers can be included]]		[[Image:Si waveguide em.jpg\|thumb\|300px\|Silicon waveguide in which EO polymers can be included]]




	The Scanning Electron Microscope can be used to expose light sensitive resist allowing the production of extremely fine detail features by etching. This is convenient for doing single prototypes but is since the process is relatively slow it is not practical for multiple manufacturing runs.		The Scanning Electron Microscope can be used to expose light sensitive resist allowing the production of extremely fine detail features by etching. This is convenient for doing single prototypes but is since the process is relatively slow it is not practical for multiple manufacturing runs.

	~~<swf width="500" height="400">images/b/bd/Ebeamlith.swf</swf>~~

	=== SEM with Nabity ===		=== SEM with Nabity ===
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	#The NPGS identifies the writing (PG) and alignment (AL) programs in a "run file". PG writes a pattern by simultaneously controlling the x-y scan coils and beam blanking of the microscope. AL allows the alignment of patterns to existing alignment marks without exposing the writing area.		#The NPGS identifies the writing (PG) and alignment (AL) programs in a "run file". PG writes a pattern by simultaneously controlling the x-y scan coils and beam blanking of the microscope. AL allows the alignment of patterns to existing alignment marks without exposing the writing area.

	~~[http:~~//~~www.jcnabity~~.~~com~~/ ~~JC Nabity website for SEM e-beam conversion]~~		<swf width="500" height="400">images/b/bd/Ebeamlith.swf</swf>


	=== Operation ===		=== Operation ===

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	=== External Links ===		=== External Links ===
			*[http://www.jcnabity.com/ JC Nabity website for SEM e-beam conversion]

	*[[wikipedia:Electron_beam_lithography E-beam lithography]]		*[[wikipedia:Electron_beam_lithography E-beam lithography]]

	*[http://www.microscopy-analysis.com/news/university-washington-orders-jeol-jbx-6300fs-direct-write-e-beam-lithography-system-microfabric UW Jeol E-beam]		*[http://www.microscopy-analysis.com/news/university-washington-orders-jeol-jbx-6300fs-direct-write-e-beam-lithography-system-microfabric UW Jeol E-beam]

Cmditradmin at 22:03, 2 June 2011

2011-06-02T22:03:53Z

← Older revision		Revision as of 15:03, 2 June 2011
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	~~See Wikipedia [http://en.wikipedia.org/wiki/Electron_beam_lithography E-beam lithography]~~

	The Scanning Electron Microscope can be used to expose light sensitive resist allowing the production of extremely fine detail features by etching. This is convenient for doing single prototypes but is since the process is relatively slow it is not practical for multiple manufacturing runs.		The Scanning Electron Microscope can be used to expose light sensitive resist allowing the production of extremely fine detail features by etching. This is convenient for doing single prototypes but is since the process is relatively slow it is not practical for multiple manufacturing runs.
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	{{#ev:youtube\|ktkDqofYfMY}}		{{#ev:youtube\|ktkDqofYfMY}}

			=== External Links ===
			*[[wikipedia:Electron_beam_lithography E-beam lithography]]

	~~=== Dedicated E-beam ===~~		*[http://www.microscopy-analysis.com/news/university-washington-orders-jeol-jbx-6300fs-direct-write-e-beam-lithography-system-microfabric UW Jeol E-beam]
	[http://www.microscopy-analysis.com/news/university-washington-orders-jeol-jbx-6300fs-direct-write-e-beam-lithography-system-microfabric UW ~~order~~ Jeol E-beam]

Cmditradmin: /* Overview */

2011-06-02T22:01:58Z

Overview

← Older revision		Revision as of 15:01, 2 June 2011
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	See Wikipedia [http://en.wikipedia.org/wiki/Electron_beam_lithography E-beam lithography]		See Wikipedia [http://en.wikipedia.org/wiki/Electron_beam_lithography E-beam lithography]

			The Scanning Electron Microscope can be used to expose light sensitive resist allowing the production of extremely fine detail features by etching. This is convenient for doing single prototypes but is since the process is relatively slow it is not practical for multiple manufacturing runs.

			<swf width="500" height="400">images/b/bd/Ebeamlith.swf</swf>

	=== SEM with Nabity ===		=== SEM with Nabity ===

Cmditradmin at 16:15, 29 June 2010

2010-06-29T16:15:20Z

← Older revision		Revision as of 09:15, 29 June 2010
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			<table id="toc" style="width: 100%">
			<tr>
			<td style="text-align: center; width: 33%">[[Main_Page#Research Equipment, Devices and Techniques\|Return to Research Tool Menu]]</td>

			</tr>
			</table>
	=== Overview ===		=== Overview ===

Smhunter at 21:46, 3 June 2010

2010-06-03T21:46:20Z

← Older revision		Revision as of 14:46, 3 June 2010
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	=== Operation ===		=== Operation ===
	~~Georgia Tech Microelectronics Research Center Training Video for JEOL JBX 9300FS EBL~~
	~~{{#ev:youtube\|q8h5xYJX-_U}}~~

			Part 1:
			{{#ev:youtube\|bvgITKqYpuY}}

			Part 2:
			{{#ev:youtube\|fZmC5xeHHaw}}

			Part 3:
			{{#ev:youtube\|ktkDqofYfMY}}

	~~{{#ev:youtube\|SQhP-k8iYWM}}~~

	=== Dedicated E-beam ===		=== Dedicated E-beam ===
	[http://www.microscopy-analysis.com/news/university-washington-orders-jeol-jbx-6300fs-direct-write-e-beam-lithography-system-microfabric UW order Jeol E-beam]		[http://www.microscopy-analysis.com/news/university-washington-orders-jeol-jbx-6300fs-direct-write-e-beam-lithography-system-microfabric UW order Jeol E-beam]

Cmditradmin: /* Operation */

2009-12-29T21:28:03Z

Operation

← Older revision		Revision as of 14:28, 29 December 2009
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	=== Operation ===		=== Operation ===
			Georgia Tech Microelectronics Research Center Training Video for JEOL JBX 9300FS EBL
	{{#ev:youtube\|q8h5xYJX-_U}}		{{#ev:youtube\|q8h5xYJX-_U}}

Cmditradmin: /* Operation */

2009-12-29T21:25:29Z

Operation

← Older revision		Revision as of 14:25, 29 December 2009
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	=== Operation ===		=== Operation ===
	{{#ev:youtube\|q8h5xYJX-_U}}		{{#ev:youtube\|q8h5xYJX-_U}}


	{{#ev:youtube\|SQhP-k8iYWM}}		{{#ev:youtube\|SQhP-k8iYWM}}